Equipments

Ultrafast Femtosecond Laser (超快雷射)

Mode-locked Ti: Sapphire Laser (Tsunami, Spectra-Physics, USA)
The mode-locked Tsunami laser delivers continuously tunable output over 720 to 850 nm wavelengths. It has 80 MHz repetition rate, < 80 fs pulse width, and provides around 1 W power at 800 nm with proper pumping. the laser is utilized as the light source to the scanning two-photon excited fluorescence microscope and as the seed beam of the Ti:Sapphire ultrafast amplifier.鎖模鈦藍寶石超快雷射
為美國Spectra-Physics推出的Tsunami超快雷射,手動波長可調範圍為720-850 nm,80 MHz重複率,小於80 fs脈衝寬度,在800 nm中心波段可提供約1 W之功率,主要提供實驗室掃描式雙光子激發螢光顯微鏡當作激發光源或提供鈦藍寶石再生放大器超快雷射當作種子光源使用。
Ti: Sapphire Ultrafast Amplifier(Spitfire Pro., Newport, USA)
By utilizing an ultrafast oscillator (Tsunami, Spectra-Physics, USA) as the seed beam of the amplifier. Thus, the ultrafast amplifier has a maximum peak power of 400 μJ/pulse, a pulse width of 90 fs, and an adjustable wavelength from 750 nm to 830 nm at an average power of 4.0 W and a repetition rate of 10 kHz. Consequently, temporal focusing efficiency for the multiphoton process can be enhanced, allowing for faster multiphoton-induced reduction and ablation, the excitation size on the sample can be as large as 200 μm*200 μm.鈦藍寶石再生放大器超快雷射
提供一般傳統鈦藍寶石超快雷射脈衝的8000倍脈衝能量,適用於需要高能量的雷射加工應用,同時也適用於本實驗室所發展的時域聚焦多光子顯微技術,提供足夠的能量同時激發超過200 μm*200 μm面積的訊號。
Optical Parametric Amplifier, OPA(TOPAS Prime F, Newport, USA)
The TOPAS Prime automated optical parametric amplifier (OPA) is a state-of-the-art 
instrument for wavelength extension of the Spitfire Ti: Sapphire amplifier system. The TOPAS Prime is entirely computer-controlled which minimizes time adjusting the laser system and maximizes experimental productivity. Wavelengths can be generated from 570 nm to 1160 nm with a second-harmonic module.自動化光參數放大器
此光參數放大器為鈦藍寶石再生放大器超快雷射的後端波長延展擴充系統。為全電腦自動化操控,避免過多人為需要的調整以方便系統整合使用。可調波長範圍搭配二倍頻模組可從570 nm調整至1160 nm
Griffin Ti: Sapphire Oscillator
The passive ultrafast laser bandwidth is around 60~70 nm and could deliver sub-femto (~20 fs) pulse width. Since the pulse width is shorter than the usual Ti: Sapphire oscillator, the pulse peak power is high enough for laser machining application and three-photon fluorescence excitation.

Griffin鈦藍寶石振盪器
為一被動式超快雷射,其操作頻寬(bandwidth)約為60~70 nm,因此可提供次飛秒脈衝寬度(~20 fs)的雷射脈衝。由於脈衝寬度比一般鈦藍寶石振盪器還短,因此雷射瞬間功率相對也比較大。為一適合用來當作雷射加工或三光子實驗的雷射光源。

Microscope (顯微鏡)

Upright Temporal Focusing-based Two-photon Excited Fluorescence Microscope
The system uses Titanium-sapphire ultrafast amplifier as a light source which could provide enough power to excite150 µm*150 µmregion. DMD (digital micromirror device) is adopted as an optical diffraction element to separate different spectral components into different angles. The 4-f setup could recombine the spectral components and restore the shortest pulse to excite two-photon fluorescence image. EMCCD with high sensitivity is used to detect the wide-filed image and could achieve 100 frame rate. The DMD also provides the advantage that could generate the user-defined pattern to do the wide-field pattern illumination and fast 3D structural polymerization.

正立式時域聚焦雙光子激發螢光顯微鏡
以鈦藍寶石再生放大器超快雷射為光源,搭配數位微型反射鏡元件當做系統繞射元件將脈衝雷射不同頻域分光,再藉由後端
4-f系統達成時域聚焦,並可以激發廣視域雙光子螢光影像,激發面積可達150 µm*150 µm2,後端有高靈敏度EMCCD接收,取像速度可達100 fps以上。系統亦可藉由數位微型反射鏡元件本身改變圖樣的優點進行廣視域的圖樣激發或三維快數聚合物成形之研究。

Inverted Scanning Two-photon Excited Fluorescence Microscope
The microscope uses the Ti: Sapphire laser as light source and has two-axis galvanometer mirror for 2D scanning. The 3D two-photon fluorescence image is reconstructed by photon counting with motorized mechanical stage or pzt stage for z-axis scanning. An acoustic-optic modulator (AOM) is adopted in the system as a fast optical switch for 3D pattern excitation. This technique could be applied to 3D polymerization and micro-surgery. Furthermore, the system integrated with time-correlated single-photon counting (TCSPC) for fluorescence lifetime image (FLIM). The system now has 3 PMTs for simultaneously 3-channel detection.

倒立式掃描式雙光子激發螢光顯微鏡
以超快雷射為光源,使用雙軸震鏡掃描器進行二維雷射掃描,搭配馬達機械式平台與pzt平台進行z軸掃描並藉由光子計數系統以建構三維雙光子激發螢光影像。其中更搭配聲光調變器來進行快速光開關來實現圖樣式三維掃描,主要用於三維高分子成型與雷射微加工手術。系統更結合時間相關單光子計數技術可量得螢光生命週期影像資訊。後端目前共有三組PMT可同時收取三道不同螢光波段。

Atomic Force Microscope
In our lab, we have an atomic force microscope (AFM) operating in intermittent contact mode and constant contact mode in air. By using the piezo stack actuator XYZ sample scanning stage ensuring high and topography. The application can be utilized in optics, polymers, biology, semiconductors, and materials science.

原子力顯微鏡
本實驗室的原子力顯微鏡為單機台的
NT-MDT設施,可利用探針與樣品表面的交互作用在光學、高分子、生物醫學和材料科學上的表面形態等測量模式,另外亦可以由一個獨立的電子模組作電性的測量,一般樣品大小限制於100*100µm,最小解析度約可以至10nm

High-vacuum Sputter System (高真空濺鍍系統)

High-vacuum Sputter System 
Preparation of metal or dielectric film may be utilized in surface plasma resonance biological sensing system, the thickness can be precisely controlled to ± 1nm.高真空物理濺鍍系統
備製金屬或介電膜可利用於表面電漿共振生物感測系統上,厚度可精準控制至±1nm

Surface Plasmon Resonance Biosensing System (表面電漿共振生物感測系統)

Surface Plasmon Resonance Biosensing System 
Has the advantages of label-free and high sensitivity. It can be used to analyze biomolecular interaction for small biomolecular in low concentrations. In our lab, we proposed a novel metal nanostructure to increase the sensitivity, the detection limit to reach can be achieved to 100fg/mm
2 of the surface coverage of biomolecular.表面電漿共振生物感測系統
具有無須標定代測物與高靈敏度等優點,可即時量測分析生物分子之間作用情形。而本實驗室採用聚金屬奈米粒子之
SPR,可成功的將靈敏度提高10倍,達到100fg/mm2之表面生物分子覆蓋程度。

Experimental Area 實驗區